Chemical liquid supply device
Chemical liquid supplying apparatus P112
Control of temperature and fluid / Chemical liquid supply device
- Product Summary
- It is used to supply chemical liquid of a predetermined concentration to the CMP apparatus, and It has the function of supplying 2 lines of 2 kinds.
- Use
- Semiconductor manufacturing equipment
specification
-
Model
P112
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Diluted solution
ＮＨ４０Ｈ、Ｈ２Ｏ２、ＨＦ、ＤＩＷ
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Flow row rate used
2.2Ｌ/min max 2LINES
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Dilution time
1 min/2.2Ｌ
-
Supply pressure
0.2MPa max
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Power supply
Single-phase
100V～240Ｖ±10%、15A
canister unit P82
Control of temperature and fluid / Chemical liquid supply device
- Product Summary
- Acid type 2, alkaline type 1 undiluted liquid containers are stored, and undiluted liquid is supplied by pressurized pressure feed by N 2
- Use
- Stock supply of the CMP apparatus
specification
-
filter
Capsule filter 0.1 micron made of polysulfone
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The chemical
Acid-based H2O2, HF alkali-based NH4OH
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valve
Air operated valve PTFE
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exhaust
Dampers, manometer built
(External site IPROS)
Additive dropping device P101
Control of temperature and fluid / Chemical liquid supply device
- Product Summary
- This device is a device for mixing an additive to cutting water
- Use
- Dicing machine
specification
-
Model
P10A
-
DIW
1～5L/min
-
Additives adjustment range
2.4～12mL/min